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Air Liquide, a leading industrial gas company, has announced plans to invest more than USD 50 million in a new gas production facility in the southeastern United States. The plant, scheduled to begin operations by late 2027, will specialize in manufacturing ultra-pure nitrogen and oxygen for semiconductor applications. These high-purity gases are critical components in chip fabrication processes.

The facility's design prioritizes meeting the stringent purity requirements of the semiconductor industry. This investment builds on Air Liquide's thirty-year partnership with the US electronics sector and aligns with broader efforts to strengthen domestic semiconductor manufacturing capabilities.

This development supports the US government's strategic objective to significantly expand its share of global chip production. Current plans aim to increase the nation's production capacity from negligible levels in 2021 to approximately 30 percent of worldwide output by 2032. Industry projections suggest US fabrication plants could account for about 10 percent of advanced DRAM chip manufacturing by 2035, according to data from the National Institute of Standards and Technology.

The new facility represents both a technological advancement in gas production and a strategic contribution to rebuilding America's semiconductor supply chain. Its operations will directly support the growing needs of chip manufacturers while helping reduce reliance on foreign production capabilities.